Capacitors added to metal rods

How are capacitors made?

Various capacitors are created using the described 3D structures as the lower electrode, with anodic alumina and atomic layer deposited HfO 2 as the dielectric. Al and Cu top electrodes are also investigated. Large values of capacitance densities as high as 3.2 μ F cm −2 are achieved.

What is an electrochemical capacitor?

Electrochemical capacitor, which is also called SC, is a device similar to capacitor, but possessing a high energy storage ability and a very high current when discharged, promising for a variety of applications . The main parts of a SC are the electrode, electron separator/proton-conducting membrane and electrolyte.

Why are flat capacitors used in alumina dielectrics?

In the case of the alumina dielectric, flat capacitors were also created in order to provide a direct comparison to the 3D structured devices, which from this point on will be referred to as NW-based capacitors. Figure 3. Schematic representation of the overall structure of the devices fabricated using the Al covered Si NWs.

Which materials are used in MIM capacitors with anodic alumina deposited HfO 2?

These Al covered Si structures were used as the bottom electrodes in MIM capacitors with anodic alumina and ALD deposited HfO 2 dielectrics. Al and Cu were investigated as the top electrode materials. All created capacitors were shown to have small series resistances and stable operation up to frequencies of 10 5 Hz.

Why is CNF a good electrode for electrochemical capacitors?

For example, porous CNF with additive Mg showed a very high specific capacitance of 248 F g −1 . Due to their prominent properties for SCs, CNF is considered as one of the best and most suitable materials as electrodes for electrochemical capacitors when incorporating with other TMOs or MOs.

How do you increase the effective area of a MIM capacitor?

In the case of MIM capacitors, a common method for increasing the effective area is to create a 3D structure in a dielectric or a semiconductor and then deposit a MIM tri-layer to create the capacitor [9 – 17].